Author(s): Gurudharshini Natarajan, Madhumitha Muthusamy, Muthusaravanan Sivaramakrishnan, Perianayaki Periasamy, Poornimmashree A, Kumaravel Kandaswamy

Email(s): kumaravel.k.bt@kct.ac.in

DOI: 10.5958/2321-581X.2017.00063.0   

Address: Gurudharshini Natarajan, Madhumitha Muthusamy, Muthusaravanan Sivaramakrishnan, Perianayaki Periasamy, Poornimmashree A, Kumaravel Kandaswamy*
Department of Biotechnology, Kumaraguru College of Technology, Coimbatore 641049, Tamil Nadu, India.
*Corresponding Author

Published In:   Volume - 8,      Issue - 4,     Year - 2017


ABSTRACT:
Antimicrobial resistance (AMR) pose a serious threat to the physicians as bacterial strains evolve to counteract the effects of medication. Staphylococcus aureus is one such bacterial strain that was well known for its resistance to methicillin - a narrow-spectrum ß-lactam antibiotic of the penicillin class. Although Methicillin-resistant S. aureus (MRSA) is not always pathogenic but historically associated with Hospital Acquired Infections (HAI), respiratory infections such as sinusitis, and food poisoning. In the recent years, bacterial strains such as Pseudomonas aeruginosa, Escherichia coli, Enterococcus faecalis, Streptococcus pyogenes have also been identified and well-studied for their ability to counteract antimicrobials. On this note, this article provides a comprehensive understanding on the antimicrobial strategies adopted globally to overcome the threat of drug resistant bacterial strains.


Cite this article:
Gurudharshini Natarajan, Madhumitha Muthusamy, Muthusaravanan Sivaramakrishnan, Perianayaki Periasamy, Poornimmashree A, Kumaravel Kandaswamy. A Big Picture on Antimicrobial Strategies then and now. Research J. Engineering and Tech. 2017; 8(4): 361-364. doi: 10.5958/2321-581X.2017.00063.0

Cite(Electronic):
Gurudharshini Natarajan, Madhumitha Muthusamy, Muthusaravanan Sivaramakrishnan, Perianayaki Periasamy, Poornimmashree A, Kumaravel Kandaswamy. A Big Picture on Antimicrobial Strategies then and now. Research J. Engineering and Tech. 2017; 8(4): 361-364. doi: 10.5958/2321-581X.2017.00063.0   Available on: https://www.ijersonline.org/AbstractView.aspx?PID=2017-8-4-13


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DOI: 10.5958/2321-581X 


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